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Chips and ChangeHow Crisis Reshapes the Semiconductor Industry$
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Clair Brown and Greg Linden

Print publication date: 2009

Print ISBN-13: 9780262013468

Published to MIT Press Scholarship Online: August 2013

DOI: 10.7551/mitpress/9780262013468.001.0001

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Limits to Moore’s Law

Limits to Moore’s Law

Chapter:
(p.95) Crisis 5 Limits to Moore’s Law
Source:
Chips and Change
Author(s):

Clair Brown

Greg Linden

Publisher:
The MIT Press
DOI:10.7551/mitpress/9780262013468.003.0078

This chapter focuses on the limitations of Moore’s Law. Although Moore’s Law is capable of providing an economic basis for the industry’s business model, the lines drawn by it suggest growing challenges that are in need of more innovative solutions. The chapter, then, gives a brief overview of how lithography evolved, and how this evolution influenced the industry and took it beyond its current “optical” infrastructure. It marks the beginning of Photolithography, or optical lithography, as it is collectively known, and how Gordon Moore himself predicted its limitations and its cessation. Thus, the search for postoptical solutions occurred, beginning in the 1970s. In a push toward techonological developments, the design-for-manufacturing challenge was posed and met, resulting in the thinning separation between leading-edge fabless companies and their foundries. The future of the industry lies in cooperation as well as roadmapping and transparent design for manufacturing.

Keywords:   lithography, Gordon Moore, optical lithography, photolithography, postoptical solutions, design for manufacturing, fabless companies, roadmapping, transparent design

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